The 20 nm SiO2 encapsulation layer in this research was deposited using a GEMStar XT-P, a plasma enabled atomic layer deposition system Learn More > Desalination of water using ALD + MLD Researchers at Blaustein
REFRACTIVE indexATOMIC layer depositionGEOMETRYPHOTOLUMINESCENCEMEASUREMENT errorsOptical characterization of nanoporous alumina-based structures (NPA-bSs), obtained by ALD deposition of a thin conformal SiO2 layer on two alumina nanosupports with different geometrical parameters (pore size and interpore distance...
Laser-induced damage studies have shown that the LIDT of multilayer coatings consisting of HfO2 and SiO2 is strongly related to the properties of the high-refractive-index HfO2 layer [19,20]. The high impurity content [21] and non-stoichiometric ratios [22] in PEALD HfO2 coatings lead to in...
According to ellipsometric measurements, the refractive index was the same 1.44 for all the films regardless of deposition temperature. The composition of the film matches SiO2 according to XPS. Also RBS gave the same Si:O ratio of 0.5. The films contain hydrogen, and also some nitrogen and ...
In particular, HfO2 is used to replace silicon dioxide (SiO2) in transistors as the higher dielectric constant of HfO2 (∼20) compared to that of SiO2 (∼3.9) allows for a thicker gate oxide layer, which reduces the gate leakage current and improves transistor performance [6]. Show ...
For example, preparation of high quality optical coatings for ALD is intriguing, but poor availability of processes for materials of low refractive index limits its applicability. Although metalremains the principle material for visible wavelength optical structures.fluorideprocessesareemerging,SiO2Matti ...
Refractive indexWet etchingAtomic layer deposition (ALD) enables coating complex shaped substrates with excellent uniformity along the surface of the optic. Recently developed nanoporous SiO2 layers have been applied as single layer antireflection coatings on fused silica substrates at both 1064 nm and ...
Enhancing the durability of Pt nanoparticles for water electrolysis using ultrathin SiO2 layers 2024, Catalysis Science and Technology Show abstract The improved properties of solution-based InGaSnO (IGTO) thin film transistor using the modification of InZnO (IZO) layer 2023, Vacuum Citation Excerpt ...
Optical changes associated with the surface coating of different metal oxides and nanolayers by the ALD technique of a nanoporous alumina structure (NPAS) obtained by the two-step anodization method were analyzed. The NPASs were coated with: (i) a single layer (SiO2 or TiO2), and (ii) a ...
The fitting model included a HfO2/SiO2/Si stack. The field emission scanning electron microscopy (FESEM, sigma 500, Oberkochen, Germany) and atomic force microscopy (AFM, XE7, Suwon, South Korea) characterizations were carried out to study surface morphology and roughness of HfO2 films. The ...