采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜. 互联网 Reactive magnetic sputtering ( RMS ) is widely used in optical coating preparation. 反应 磁控溅射 广泛应用于制备光学薄膜. 互联网 The CeO 2 - x films were deposited from a sintered Ce
补充资料:磁控溅射 分子式:CAS号:性质:用一个环形永久磁体在乎板形靶上产生环形磁场,在磁场作用下,电子被约束在一个环状空间内,形成高密度的等离子环。在等离子环内,电子不断地使Ar原子变成Ar离子,Ar离子被加速后打向靶表面,把靶内的原子溅射出来,沉积在基片上形成薄膜。若靶材为导体,溅射电源可用直流或射频电源...
磁控溅射 翻译结果4复制译文编辑译文朗读译文返回顶部 磁性飞溅 翻译结果5复制译文编辑译文朗读译文返回顶部 磁性飞溅 相关内容 avaluate the Confidential Information for the purpose hereof. valuate机要信息为于此目的。[translate] ai have been thee 我是thee[translate] ...
aroble tinto ribera del duero 铆钉红色 duero的岸[translate] aSilicone material lined with steel piece 硅树脂材料标示用钢片断[translate] afree fall TEST free case TEST[translate] aDUNAI 正在翻译,请等待...[translate] a磁控溅射 Magnetism controls the sputtering[translate]...
采用射频反应磁控溅射制备了高C轴取向的AlN薄膜。 2. The high-k dielectric HfOxNy films were prepared by rf reactive sputtering in oxygen and nitrogen surroundings. 采用射频反应磁控溅射法制备了HfOxNy栅介质薄膜,并研究了HfOxNy栅介质薄膜的化学特性和界面结构随淀积温度的变化而发生的变化规律。 3. The...
磁控溅射 中文磁控溅射 英文【化】 megnetron sputtering
英文: THE STUDY OF DC TETRODE SPUTTERING TECHNOLOGY中文: 直流四极溅射工艺研究 英文: We found that sputtering pressure and sputtering time determine the deposition rate and thickness of the A1 film, respectively.中文: 溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度。
利用中频磁控反应溅射技术,以高纯Al为靶材、高纯N2为反应气体,在Si(111)衬底上成功制备出氮化铝薄膜。3) mid-frequency alternative reactive magnetron sputtering 中频交流反应磁控溅射 1. N-doped TiO2 films were prepared by mid-frequency alternative reactive magnetron sputtering. 用中频交流反应磁控溅射方法制...
对向靶溅射 1. the functionally gradient iron nitrides thin films were prepared by facing targets sputtering. 用对向靶溅射仪制备了具有梯度结构的氮化铁薄膜材料。 6) mid-frequency dual-magnetron sputtering 中频对靶磁控溅射 1. Investigation on Cr-doped diamond-like carbon films prepared bymid-frequency...