Research on microstructure and mechanics properties of 316L stainless steel/SiO_2 ceramic composite film prepared by RF/DC sputtering; RF/DC溅射316L/SiO_2复合膜力学性能与显微结构的研究4) RF-sputtering RF-溅射5) R.F. Sputtering RF溅射法6...
共溅射1. Amorphous SmCo magnetic films were fabricated by magnetron co-sputtering method and the magnetic properties were measured by a vibrating sample magnetometer(VSM). 采用磁控共溅射方法制备了非晶态的SmCo磁性薄膜,用振动样品磁强计(VSM)分析了薄膜的磁学性能,并通过原位后退火处理研究了其磁学性能。
射频反应共溅射 1. Indium-doped zinc oxide films of various contents of In were deposited on silicon substrates by RF reactive co-sputtering. 通过射频反应共溅射法在硅衬底上制备了不同In掺杂量的ZnO薄膜,表征了薄膜的结构和表面形貌,研究了In掺杂量对znO薄膜的结构特性的影响。3) DC reactive co-sputte...
直流共溅射2) RF/DC magnetron sputtering 直流/射频共溅射 1. The p-type ZnO:Al films deposited by RF/DC magnetron sputtering at room temperature were treated by gaseous ammonia annealing. 采用NH3气氛处理直流/射频共溅射方法制得的ZnO:Al薄膜,从而获得Al+N共掺p型ZnO薄膜。3) DC magnetron co-...
共溅射沉积例句>> 2) Sputtering [英]['spʌtə] [美]['spʌtɚ] 溅射沉积 1. A systematic methodology has been proposed to investigate the feasibility of the manufacture of ?3" double-sided YBCO thin films by inverted cylindrical sputtering(ICS) with bi-axial substrate rotation. 在...
磁控共溅射法2) radio frequency magnetron co-sputtering 射频磁控共溅射法3) magnetic control 磁控 1. Study on magnetic control modified duplicated compound matter govern manage algal blooms; 磁控改性复配物治理水华的研究 2. Multi-pulsed spot welding and magnetic controlled AC spot/seam welding; 多脉冲...
离子束多靶溅射6) ion-beam sputtering 离子束溅射 1. Si/Ge multilayer films were prepared by ion-beam sputtering. 采用离子束溅射制备Si/Ge多层膜,通过X射线小角衍射计算其周期厚度及各子层的厚度,用Raman光谱对Si/Ge多层膜的微观结构及Si子层的结构进行表征。 2. Si/Ge multilayer films have been ...
将自行研制的激光溅射电离飞行时间质谱仪(LAI-TOFMS)用于辉绿岩(GBW07123)、石榴石和硅化木3种矿物样品的直接分析,初步讨论了元素含量和元素相对含量的计算方法,计算过程中选Mn作参考元素,并将LAI-TOFMS与电感耦合等离子体质谱(ICP-MS)、X射线荧光光谱(XRF)在样品分析过程和分析结果方面进行比较。
双靶直流磁控共溅射 1. Cu-doped TiO2 thin films were prepared byDC reactive magnetron co-sputtering with two targets. 采用双靶直流磁控共溅射法制备了掺铜TiO2薄膜,通过控制Cu靶的溅射功率改变Cu的掺杂量,研究了掺铜对TiO2薄膜的结构、光吸收及光催化性能的影响。
双靶直流磁控共溅射 1. Cu-doped TiO2 thin films were prepared by DC reactive magnetron co-sputtering with two targets. 采用双靶直流磁控共溅射法制备了掺铜TiO2薄膜,通过控制Cu靶的溅射功率改变Cu的掺杂量,研究了掺铜对TiO2薄膜的结构、光吸收及光催化性能的影响。补充...