The following results were obtained: The effect of power on the properties of H +Ar plasma was studied by OES. The 2 intensity of Ar line at 750.4 nm increased obviously with the increase the ICP (13.56 MHz) power while the higher frequency (60 MHz) and lower frequency (2 MHz) had ...
电感耦合等离子体原子发射光谱仪ICP-OES 低价出售斯派克 低价 上海金谱仪器有限公司 2年 查看详情 ¥5万 ~ 16万 等离子体模拟-锦科科技-专业技术团队专业服务 厂家直销 多场景 上海锦科信息科技有限公司 查看详情 面议 电感耦合等离子体质谱ICP-MS7500 一网推品牌 金财鑫科技有限公司 1年 查看详情 ¥...