申请(专利权)人: HITACHI METALS LTD 日立金属株式会社 发明人:A Setsuo,安藤 節夫,E Minoru,遠藤 実,N Tsutomu,中村 勉,F Toru,福士 徹 摘要: PROBLEM TO BE SOLVED: To provide an R-T-B-base magnet having an electrolytic copper plating film which is nearly uniform in a film thickness, is ...